SE 400adv - the latest laser (scanning) ellipsometer manufactured by SENTECH Instruments GmbH (Germany) with the ability to measure films at different angles is designed for high-precision measurement of the thickness and optical characteristics of film structures (refractive index, absorption index) on various types of surfaces. Measurement of nanofilms.

Wavelength - 632.8 nm Film
thickness measurement range: 1 nm to 6000 nm.

Application: Measurement of thickness and refractive index of single layers or two-layer films (with known sublayer parameters) in production or laboratory.
 

Peculiarities

• High stability and accuracy when measuring with a light source (HeNe laser, 632.8 nm.), thermally stabilized compensator, polarizer control, ultra low noise detector.
• High accuracy of sample alignment (height and tilt adjustment) using an autocollimatic telescope (ACT).
• Fully integrated support for multi-angle measurements with advanced SENTECH software.
• A complete package of pre-installed applications in microelectronics, photovoltaics (solar cells), etc.
• Friendly interface and ease of operation.
• High measurement speed
• SENTECH software for ellipsometric measurements, which includes an application library:

n, k bulk material
thickness of monolayers
thickness and refractive index of monolayers
thickness and refractive index of the upper layer of the double layer
specified ellipsometric applications
 

Options

- 30 µm microspot (spot focusing)

- Manual xy stage (travel - 150 mm) for mapping (mapping)

- Motorized computer controlled stages for samples up to 200 mm in diameter and high precision movement for mapping (mapping)

- Video camera for alignment of the sample instead of the eyepiece with image output and PC.

- Liquid cell

- Autofocus in combination with a motorized sample leveling

stage - Reflectometer (Film Thickness Probe) FTPadv with a spot diameter of 80 µm.

- SIMULATION Software

- Installation for measurements of films on crystalline silicon (textured)