Ultima IV - multi-purpose X-ray diffractometer (XRD) with a horizontal arrangement of the test sample manufactured by RIGAKU (Japan)

For more than 50 years, the Japanese company Rigaku Corporation (Rigaku) ​​has been specializing in the production of X-ray diffractometers. Thanks to experience, innovative design solutions, high level of production, RIGAKU has become a world leader in X-ray spectrometry, diffraction, X-ray optics and molecular and protein crystallography. A large number of models of devices manufactured by RIGAKU allow you to choose the one that best meets the needs of the user. This determines the great popularity of RIGAKU equipment all over the world.


RIGAKU Ultima IV diffractometer is a new development of Rigaku company. To date, it is the only diffractometer with a fully automatic goniometer adjustment function. The Rigaku Ultima IV diffractometer implements all currently possible options and attachments for diffractometers to solve a wide range of problems.

Rigaku presented its new Ultima IV model for the first time at the X-Ray Conference in Denver, once again proving to the public the speed of its reaction, as a manufacturing company, to follow the latest trends in materials research and even stay ahead of them. Thus, a revolutionary step in the development of the hardware capabilities of modern diffractometers was the introduction of SAXS, small-angle X-ray scattering, and in-plane, in-plane analysis, into the standard q/q diffractometer configuration. Now there is no need to buy two instruments or take risks with a synchrotron to solve such problems.

SAXS / Small Angle X-Ray Scattering
The SAXS option was introduced by Rigaku in response to the need to investigate nanostructured materials. For a better understanding of the entire morphology of a nanostructured system, it is necessary to analyze both the low-angle and high-angle range of the scattering curve angles. Small-angle scattering is used to determine the long-range order, including determining the interaction between particles and their size. The high-angle range reveals the phase composition of the analyzed material, the size of crystallites, the degree of crystallization, etc. Both of these methods, as well as other analytical equipment, help to characterize the physical dimensions of nanoparticles. The SAXS option is also extended for the reflection mode when studying the size of particles and pores in thin films on substrates, including those on the surface of liquids.

In-plane / In-plane analysis
An in-plane scattering attachment with detector rotation parallel to the surface of the analyzed sample also expands the possibilities of thin film analysis. While most laboratory studies are carried out in standard geometries, synchrotron analysis has the advantage of being a scattering method for obtaining information directly from the surface of a thin film sample. As films become thinner, X-ray diffraction methods in standard geometry either provide weak information or confusing information due to small crystallite sizes or amorphous structures. Many properties of materials are due to the state of the structure in the plane, rather than from the structure in the direction transverse to it.
With the advent of the Ultima III diffractometer, in-plane diffraction studies can now be performed in the laboratory. Such studies can help in constructing the function of the phase composition over the depth of the analyzed layer, in determining the preferential orientations, internal stresses, etc. There is no need to change such an attachment for standard experiments, it is enough to change the system of slots.
Ultima III Rigaku, like the younger models, has the ability to quickly change the focusing scheme: divergent / parallel beam. The new cross optics (combined optical system) developed by Rigaku allows either one or the other focusing scheme to be used in a single optical module. And the change of schemes occurs with one quick turn of the focusing mirror from a curved surface to a flat one without any other additional hardware restructuring.

Areas of use

• Phase identification
• Crystal structures
• Crystallite size
• Preferential Orientations
• Perfection of the crystal structure
• Degree of crystallization
• Residual stresses
• Radial distribution function
• Orientation and structure of thin films
• Size distribution of nanoparticles and pores
• Multilayer structures (thickness, density, roughness)
• Simultaneous X-ray diffraction and calorimetric analysis

materials

• Powders (polycrystalline, bulk materials)
• Thin films (ferroelectrics, magnets, etc.)
• Massive single crystals
• Liquids

Options and attachments :

- Parallel beam shaping module

Parallel x-ray beam is formed by a multilayer parabolic mirror (patented technology CBO - cross beam optics). The module for forming such a beam is always installed, aligned and ready to work - the choice of parallel or focusing geometry of the analysis is carried out with one movement of the hand. It is possible to install a CBO module that makes it extremely easy to switch the focusing (Bragg-Brentano) optical system to the optical system of a parallel beam of rays of a multilayer film mirror, as well as corresponding to 5 types of optical systems: focusing optical system, parallel beam optical system, small angles, microscopic sizes and high resolution. (Japanese Patent No. 3548556).

- Choice of material (Cu, ) and type of X-ray tube
- ICDD database
- Increased goniometer radius from 185 to 285 mm. Increases the resolution of the diffractometer
- Slits of variable width. They allow to keep the irradiated surface of the sample unchanged.
- Germanium double monochromator (220) for primary beam / Ge(220) 2-bounce monochromator - SAXS / SAXS
(Small angle X-ray scattering) unit
film opt - Multi purpose thin-film attachment
- In-Plane / In-Plane sample plane analysis module
- Graphite monochromator for tube with copper anode for parallel beam optics and focusing configuration / Graphite monochromator Cu (Flexible
) - Z stage
- Microanalysis module, turntable, control program / Small Area Measurement Unit, XYZ-phi stage, CCD camera, Small Area Optics
- High-speed two-dimensional detector
- Differential scanning calorimeter / XRD-DSC
- High temperature attachment
- Medium temperature attachment (- 180 – 300℃)
- Low temperature attachments (-4K, -12K)
- Sample changer
- Sample holders of various sizes and materials
- Closed circuit heat exchangers for tube cooling
- Sample preparation equipment

- Software:

• Qualitative and quantitative analysis
• ICDD X-ray diffraction database PDF-2 or PDF-4
• Rietveld analysis
• Crystallinity analysis
• Residual austenite analysis
• Residual stress analysis
• Construction of direct and reverse pole figures. Orientation Distribution Function.

Main technical characteristics: