S-TEC is intended for preparation of objects examined in electron microscopes, as well as for obtaining multilayer, multicomponent films from metals and semiconductors by magnetron, resistive, and electronic sputtering methods.
The device can be used for research in the fields of chemistry, physics, biology, medicine, as well as for testing individual technologies for vacuum deposition and plasma etching.
Specifications |
||
one |
Camera |
Rectangular up to 0.125 m 3 |
2 |
Residual pressure, Pa |
13×10 -3 |
3 |
Evaporators |
Evaporator |
4 |
Heating temperature of objects |
1000 °C |
five |
Cooling table temperature |
-150 °C |
6 |
Control system |
industrial computer |
7 |
vacuum system |
Manual/automatic operation |
8 |
Power consumption, kV |
2 |
nine |
Water consumption, l/min |
five |
10 |
Overall dimensions, mm |
500×900×1500 |
eleven |
Weight, kg |
≈220 |
