VACUUM UNIT S-EBV TEC

The unit is designed for coating optical surfaces by resistive and electron-beam evaporation of dielectrics, semiconductors and metals with simultaneous control of the coating thickness.
The installation provides the possibility of applying multilayer achromatic coatings on optical parts, as well as metal, single-layer antireflection, interference mirror, filtering and others for various spectral regions.
The installation consists of: a working chamber, an exhaust station based on a TMP, a foreline unit, electrical equipment for powering and controlling the vacuum system and technological systems.

Specifications

Specifications
one	Pressure in the chamber, mm Hg	5×10 ^-6
2	Time to reach vacuum, min,	<20
3	Heating temperature in the chamber, °C	100…320
4	Number of resistive evaporators, pcs.	2
five	Number of electron-beam evaporators, pcs.	one
6	Number of substrate holders, pcs.	4
7	Maximum substrate size, mm	50×50
8	Plasma cleaning voltage, kV	7
nine	Current of resistive evaporators, A, at 24 V	150
10	Electron-beam evaporator current, mA	500
eleven	Power consumed by the installation, kW	twenty
12	Control system	industrial computer